Title :
Field emitter array patterning for large scale flat panel displays using laser interference lithography
Author :
Spallas, J.P. ; Boyd, R.D. ; Britten, J.A. ; Fernandez, A. ; Hawryluk, A.M. ; Perry, M.D. ; Kania, D.R.
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
fDate :
July 30 1995-Aug. 3 1995
Abstract :
Summary form only given. We present our research on interference lithography for field emission flat panel display applications. We report on a laser interference lithography technique that is capable of exposing very high density (/spl ges/10/sup 9/ dots/cm/sup 2/) sub-quarter micron patterns over very large fields (/spl ges/10/sup 4/) with excellent uniformity.
Keywords :
flat panel displays; large screen displays; photolithography; vacuum microelectronics; 0.25 micron; field emitter array; large scale flat panel display; laser interference lithography; sub-quarter micron patterning; vacuum microelectronics device; Field emitter arrays; Flat panel displays; Interference; Large-scale systems; Lithography; Microelectronics; Optical arrays;
Conference_Titel :
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location :
Portland, OR, USA
Print_ISBN :
0-7803-2143-X
DOI :
10.1109/IVMC.1995.487001
