Effect of Nitrogen Atom Doping for Electric Double Layer Capacitors Application

Author

Tashima, D. ; Kurosawatsu, K. ; Sung, Y.M. ; Otsubo, M. ; Honda, C.

Author_Institution

Dept. of Electr. & Electron. Eng., Miyazaki Univ.

fYear

2006

fDate

38869

Firstpage

908

Lastpage

911

Abstract

In this research, we measured spatio-temporal profiles of positive and negative charges in Electric Double Layer Capacitors (EDLCs) consist of activated carbon exposed to plasma discharge. The state of plasma is a high frequency glow discharge and sample of activated carbon is set on the center of glow discharge. Optimal conditions for plasma surface treatment of activated carbon have been examined with a time of 1~10 h at 150degC in N₂. As the result, nitrogen atom is doped in the surface layer of the activated carbon, and capacitance of EDLCs has a peak in case of 1 h of plasma surface treatment. It is reported that capacitance increases with the nitrogen dope. Capacitance of EDLCs increased until 1 h of treatment time, but capacitance was decreasing in case of over 1 h of treatment time

Keywords

capacitance; carbon; electrolytic capacitors; glow discharges; plasma materials processing; spatiotemporal phenomena; surface treatment; 1 h; 150 C; C:N; EDLCs; activated carbon; capacitance; electric double layer capacitors; glow discharge; nitrogen atom doping; plasma discharge; plasma surface treatment; spatiotemporal profiles; Atomic layer deposition; Capacitance; Doping; Glow discharges; Nitrogen; Plasma applications; Plasma measurements; Supercapacitors; Surface discharges; Surface treatment; electric double layer capacitor; nitrogen doping; space charge;

fLanguage

English

Publisher

ieee

Conference_Titel

Properties and applications of Dielectric Materials, 2006. 8th International Conference on

Conference_Location

Bali

Print_ISBN

1-4244-0189-5

Electronic_ISBN

1-4244-0190-9

Type

conf

DOI

10.1109/ICPADM.2006.284324

Filename

4062813