Title :
Effect of Nitrogen Atom Doping for Electric Double Layer Capacitors Application
Author :
Tashima, D. ; Kurosawatsu, K. ; Sung, Y.M. ; Otsubo, M. ; Honda, C.
Author_Institution :
Dept. of Electr. & Electron. Eng., Miyazaki Univ.
Abstract :
In this research, we measured spatio-temporal profiles of positive and negative charges in Electric Double Layer Capacitors (EDLCs) consist of activated carbon exposed to plasma discharge. The state of plasma is a high frequency glow discharge and sample of activated carbon is set on the center of glow discharge. Optimal conditions for plasma surface treatment of activated carbon have been examined with a time of 1~10 h at 150degC in N2. As the result, nitrogen atom is doped in the surface layer of the activated carbon, and capacitance of EDLCs has a peak in case of 1 h of plasma surface treatment. It is reported that capacitance increases with the nitrogen dope. Capacitance of EDLCs increased until 1 h of treatment time, but capacitance was decreasing in case of over 1 h of treatment time
Keywords :
capacitance; carbon; electrolytic capacitors; glow discharges; plasma materials processing; spatiotemporal phenomena; surface treatment; 1 h; 150 C; C:N; EDLCs; activated carbon; capacitance; electric double layer capacitors; glow discharge; nitrogen atom doping; plasma discharge; plasma surface treatment; spatiotemporal profiles; Atomic layer deposition; Capacitance; Doping; Glow discharges; Nitrogen; Plasma applications; Plasma measurements; Supercapacitors; Surface discharges; Surface treatment; electric double layer capacitor; nitrogen doping; space charge;
Conference_Titel :
Properties and applications of Dielectric Materials, 2006. 8th International Conference on
Conference_Location :
Bali
Print_ISBN :
1-4244-0189-5
Electronic_ISBN :
1-4244-0190-9
DOI :
10.1109/ICPADM.2006.284324
