• DocumentCode
    3251438
  • Title

    In-plane refocusing of a microtips electron beam by a surrounding ring

  • Author

    Py, C. ; Itoh, J. ; Hirano, T.

  • Author_Institution
    Process Fundamental Section, ETL, Ibaraki, Japan
  • fYear
    1995
  • fDate
    July 30 1995-Aug. 3 1995
  • Firstpage
    171
  • Lastpage
    175
  • Abstract
    A strong electron beam refocusing effect has been observed with a ring surrounding a single microtip or a small array of tips centered on the ring without significant reduction of the emitted current, which is an inherent problem of double-gate refocusing. By contrast, it seems difficult to obtain a significant refocusing effect for a large array of microtips (like those, for example, used to illuminate a pixel in a field emission display) with a single ring. It appears that modifying the gate lithography in the classical diode fabrication process is not good enough to obtain an effective structure, because the connection of the gate induces a dramatic dissymetry in the refocusing effect, and because a current is observed between extraction gate and focusing ring. Hence, we believe that effective refocusing of the beam can be obtained only at the price of a more complicated fabrication process.
  • Keywords
    electron beam focusing; vacuum microelectronics; electron beam; fabrication; field effect microtip array; in-plane refocusing; ring; Anodes; Electrodes; Electron beams; Laser beams; Laser excitation; Masers; Polarization; Pump lasers; Surface emitting lasers; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
  • Conference_Location
    Portland, OR, USA
  • Print_ISBN
    0-7803-2143-X
  • Type

    conf

  • DOI
    10.1109/IVMC.1995.487018
  • Filename
    487018