DocumentCode
3251438
Title
In-plane refocusing of a microtips electron beam by a surrounding ring
Author
Py, C. ; Itoh, J. ; Hirano, T.
Author_Institution
Process Fundamental Section, ETL, Ibaraki, Japan
fYear
1995
fDate
July 30 1995-Aug. 3 1995
Firstpage
171
Lastpage
175
Abstract
A strong electron beam refocusing effect has been observed with a ring surrounding a single microtip or a small array of tips centered on the ring without significant reduction of the emitted current, which is an inherent problem of double-gate refocusing. By contrast, it seems difficult to obtain a significant refocusing effect for a large array of microtips (like those, for example, used to illuminate a pixel in a field emission display) with a single ring. It appears that modifying the gate lithography in the classical diode fabrication process is not good enough to obtain an effective structure, because the connection of the gate induces a dramatic dissymetry in the refocusing effect, and because a current is observed between extraction gate and focusing ring. Hence, we believe that effective refocusing of the beam can be obtained only at the price of a more complicated fabrication process.
Keywords
electron beam focusing; vacuum microelectronics; electron beam; fabrication; field effect microtip array; in-plane refocusing; ring; Anodes; Electrodes; Electron beams; Laser beams; Laser excitation; Masers; Polarization; Pump lasers; Surface emitting lasers; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location
Portland, OR, USA
Print_ISBN
0-7803-2143-X
Type
conf
DOI
10.1109/IVMC.1995.487018
Filename
487018
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