Title :
Smart pockets-total suppression of roll-off and roll-up [MOSFET doping]
Author :
Gwoziecki, R. ; Skotnicki, T.
Author_Institution :
CNET Grenoble, France Telecom, Meylan, France
Abstract :
We have demonstrated that with use of pocket implants, there exists an asymptotic threshold voltage-gate length (V/sub th/-L) curve which can only be shifted to shorter device lengths if a larger amount of roll-up and steeper roll-off are allowed. This inherent feature of conventional pockets narrows the technological window for sub-0.1 /spl mu/m MOSFETs. Therefore, we propose a new concept called "smart pockets", enabling total annihilation of roll-up and roll-off and thus offering a perfectly flat V/sub th/-L dependence down to the desired gate length.
Keywords :
MOSFET; doping profiles; ion implantation; semiconductor device measurement; semiconductor device models; MOSFET doping; MOSFETs; asymptotic threshold voltage-gate length curve; device length; gate length; pocket implants; roll-off suppression; roll-up suppression; smart pockets; technological window; Acceleration; Analytical models; Doping; Equations; Implants; MOSFETs; Semiconductor process modeling; Telecommunications; Virtual manufacturing; Voltage;
Conference_Titel :
VLSI Technology, 1999. Digest of Technical Papers. 1999 Symposium on
Conference_Location :
Kyoto, Japan
Print_ISBN :
4-930813-93-X
DOI :
10.1109/VLSIT.1999.799355