DocumentCode :
3251967
Title :
IC´s Performance Improvement and 3D Integration by Layer Transfer Technologies
Author :
Aspar, B. ; Lagahe-Blanchard, C.
Author_Institution :
TRACIT Technol., Grenoble
fYear :
2006
fDate :
2-5 Oct. 2006
Firstpage :
8
Lastpage :
11
Abstract :
In microelectronics and MEMS (micro electro mechanical systems) industries, complex structures are required to improve IC\´s performance or to achieve high levels of integration. The level of integration is now so important that we are talking more and more about systems. Different approaches have been developed to obtain such a system. "System in package" relies on the association in a same package of several dies built on different technologies. "System on chip" integrated on single chip different functions or components often built on a similar technology. This limits the possibility of integrating circuits which perform with various technologies. Further integration requires reliable and cost effective solutions for 3D structures allowing ultimately stacking of various IC\´s on a chip. In this context, direct wafer bonding appears as a key generic technology to increase systems integration but also to achieve original structures difficult to obtain by other methods. Transfers of partially or fully processed layers onto different supports offer plenty of solutions for the fabrication of new structures. Recent results obtained by wafer bonding and thinning down techniques are presented in this paper
Keywords :
integrated circuit technology; manufacturing processes; system-in-package; wafer bonding; 3D integration; 3D structures; direct wafer bonding; integrated circuit performance improvement; layer transfer technologies; system in package; systems integration; thinning down technique; Costs; Integrated circuit reliability; Integrated circuit technology; Mechanical systems; Microelectronics; Micromechanical devices; Packaging; Stacking; System-on-a-chip; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
International SOI Conference, 2006 IEEE
Conference_Location :
Niagara Falls, NY
ISSN :
1078-621X
Print_ISBN :
1-4244-0289-1
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2006.284406
Filename :
4062854
Link To Document :
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