Title :
Field emission from plasma-treated diamond particles
Author :
Asano, T. ; Maruta, T. ; Ishikura, T. ; Yamashita, S.
Author_Institution :
Center for Microelectron. Syst., Kyushu Inst. of Technol., Fukuoka, Japan
fDate :
July 30 1995-Aug. 3 1995
Abstract :
Field emission current from synthesized diamond can be increased by hydrogen plasma treatment. On the other hand, oxygen or oxygen-contained plasma treatment drastically decreases the field emission current. These are applicable to diamond grown on various substrates. A relation between field emission and the electrical conducting layer at diamond surface is suggested.
Keywords :
cathodes; diamond; electron field emission; plasma applications; vacuum microelectronics; C; cathodes; electrical conducting layer; field emission current; plasma-treated diamond particles; synthesized diamond; vacuum microelectronics; Chemical technology; Chemical vapor deposition; Electron emission; Hydrogen; Plasma displays; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Semiconductor films;
Conference_Titel :
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location :
Portland, OR, USA
Print_ISBN :
0-7803-2143-X
DOI :
10.1109/IVMC.1995.487050
