DocumentCode
3252181
Title
A new 1T/2C merged two-terminal gain cell with SBT encapsulated floating gate MOSFET for highly scalable FeRAM
Author
Aoki, M. ; Mushiga, M. ; Itoh, A. ; Eshita, T. ; Arimoto, Y.
Author_Institution
Fujitsu Labs. Ltd., Atsugi, Japan
fYear
1999
fDate
14-16 June 1999
Firstpage
145
Lastpage
146
Abstract
We fabricated a new scalable gain cell that consists of one transistor (1T) and two ferroelectric capacitors (2C), and can select one individual cell using only two wires. The cell features an encapsulated floating gate MOSFET using SBT film and overlapped capacitors between the wire and the gate, thereby enabling simple high-level integration applicable for Gbit FeRAM. The fabricated prototype devices exhibit successful operation. The cell can write data at 5 V and read data at 2 V nondestructively, and retain data for 5000 s.
Keywords
CMOS memory circuits; MOSFET; bismuth compounds; encapsulation; ferroelectric capacitors; ferroelectric storage; integrated circuit measurement; integrated memory circuits; random-access storage; strontium compounds; 1T/2C merged two-terminal gain cell; 2 V; 5 V; 5000 s; FeRAM; SBT encapsulated floating gate MOSFET; SBT film; SrBi/sub 2/Ta/sub 2/O/sub 4/; cell data read voltage; cell data write voltage; data retention; encapsulated floating gate MOSFET; high-level integration; individual cell selection; nondestructive read/write; one transistor-two ferroelectric capacitor structure; overlapped capacitor; prototype devices; scalable FeRAM; scalable gain cell; Ferroelectric films; Ferroelectric materials; MOS capacitors; MOSFET circuits; Nonvolatile memory; Polarization; Prototypes; Random access memory; Voltage; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1999. Digest of Technical Papers. 1999 Symposium on
Conference_Location
Kyoto, Japan
Print_ISBN
4-930813-93-X
Type
conf
DOI
10.1109/VLSIT.1999.799385
Filename
799385
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