Title :
Method for Measuring the Thickness of Photoresist on Spherical Surface
Author :
Zhang Chunhui ; Liang Yiyong ; Chen Longjiang
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Abstract :
This paper shows and discusses a new type method which is two-wavelength method for measuring the thickness of photoresist on spherical surface. By two-wavelength method measuring, examine the change of intensity which reflected lights compare with incident lights, achieve the purpose of measuring the thickness of photoresist on spherical surface. The method for measuring the thickness of photoresist on plane surface has been approved, and the method of measuring the thickness on spherical surface is discussed.
Keywords :
measurement by laser beam; photoresists; thickness measurement; incident light intensity; photoresist thickness measurement; red laser light source; reflected light intensity; spherical surface; two-wavelength method; wavelength 632.8 nm; wavelength 671 nm; Coatings; Equations; Glass; Lithography; Optical films; Optical sensors; Resists; Substrates; Testing; Thickness measurement;
Conference_Titel :
Photonics and Optoelectronics, 2009. SOPO 2009. Symposium on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-4412-0
DOI :
10.1109/SOPO.2009.5230171
