Work function measurements of diamond film surfaces

We report on the growth and subsequent work function measurement of diamond film covered surfaces. Diamond films were grown via a thermal CVD technique. Two feed gas mixtures were used, 1% CH/sub 4//99% H/sub 2/ and 1% CH/sub 4//100 ppm HN/sub 3///spl sim/99% H/sub 2/. Raman spectroscopy was used to verify diamond growth. Electron emission was investigated and work function values obtained in the thermionic emission as well as field emission modes. However, we report mainly on a unique way to ascertain the absolute work function of diamond surfaces using the field emission retarding potential (FERP) technique. This experimental method readily lends itself to these types of investigations where values can be determined apart from thermal or field effects.