DocumentCode :
3252389
Title :
Novel Process Combining SOI and Strained Circuitry
Author :
Belfordab, R. ; Xu, Qing ; Sood, Sumant ; Acosta, Antonio ; Thrift, Alan ; Zell, Jordan ; Bosworth, Lloyd
Author_Institution :
Belford Res. Inc.
fYear :
2006
fDate :
2-5 Oct. 2006
Firstpage :
49
Lastpage :
50
Abstract :
In this work the authors use the most accurate measurement of strain, which is the direct (%) elongation of the polyimide carrier. This is the only appropriate method of reporting mechanical-stress induced elongation. Improvement in n-type has been calculated to be a maximum at 1.2% biaxial strains (Rim et al., 2002). The authors have observed optima at much lesser strain values by direct measurement. Anisotropic straining can be optimized to further reduce the total 3-D strain; out-of-plane compressive and in-plane tensile strain. In this way the defect problems common in biaxially strained substrates can be avoided
Keywords :
MOSFET; elongation; silicon-on-insulator; strain measurement; 3D strain; MOSFET; SOI; anisotropic straining; in-plane tensile strain; mechanical-stress induced elongation; out-of-plane compressive strain; polyimide carrier; strain measurement; strained circuitry; Biomembranes; Capacitive sensors; Circuits; MOSFETs; Polymers; Silicon on insulator technology; Strain measurement; Stress; Tensile strain; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
International SOI Conference, 2006 IEEE
Conference_Location :
Niagara Falls, NY
ISSN :
1078-621X
Print_ISBN :
1-4244-0289-1
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2006.284427
Filename :
4062875
Link To Document :
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