DocumentCode :
3252779
Title :
Insights on Carrier Mobilities and Transport in Contemporary DG FinFETs
Author :
Chowdhury, M.M. ; Trivedi, V.P. ; Fossum, J.G. ; Mathew, L.
Author_Institution :
Florida Univ., Gainesville, FL
fYear :
2006
fDate :
2-5 Oct. 2006
Firstpage :
93
Lastpage :
94
Abstract :
In this paper we calibrate our process/physics-based DG MOSFET model (UFDG (Fossum, et. al., 2004)) to contemporary DG FinFETs, and examine carrier mobilities in the undoped UTBs. The calibrated model is also used to give interesting insights on carrier transport in nanoscale DG FinFETs that contradict ITRS projections
Keywords :
MOSFET; carrier mobility; semiconductor device models; DG FinFET; ITRS projections; carrier mobilities; carrier transport; Calibration; Density measurement; Dielectric measurements; Doping; FinFETs; MOSFET circuits; Rough surfaces; Scattering; Surface roughness; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
International SOI Conference, 2006 IEEE
Conference_Location :
Niagara Falls, NY
ISSN :
1078-621X
Print_ISBN :
1-4244-0289-1
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2006.284449
Filename :
4062897
Link To Document :
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