FinFET SRAM with Enhanced Read / Write Margins

In this work, the impact of this pass-gate feedback (PGFB) technique on cell write-ability is examined, and gate workfunction (Phi_m) tuning for optimization of the trade-off with read margin is discussed. To further improve cell write-ability, the p-channel pull-up devices can also be operated in BG mode, with their back gates driven by a separate write word line. This pull-up write gating (PUWG) technique is effective for maintaining larger than 6 standard deviations yield down to 0.4V VDD without area penalty, making FinFET-based 6-T SRAM compelling for high-density memory applications