DocumentCode :
3253147
Title :
Experiments of highly emissive MOS electron tunneling cathode
Author :
Yokoo, K. ; Koshita, G. ; Hanzawa, S. ; Abe, Y.
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
fYear :
1995
fDate :
July 30 1995-Aug. 3 1995
Firstpage :
494
Lastpage :
498
Abstract :
An effective mean-free-path of hot electrons in the conduction band of SiO/sub 2/ in a Si-gate MOS cathode was measured first and was about 0.7 nm. Following these observations, we proposed and fabricated a depletion gate MOS electron tunneling cathode. The highest transfer ratio of 13.3% was achieved in the cathode at the low emission current level, which was considerably higher than that of tunneling cathodes studied in the past. However, the ratio decreased drastically at high current due to the hole injection into the depletion region from the gate.
Keywords :
MIS devices; cathodes; electron field emission; elemental semiconductors; hot carriers; silicon; silicon compounds; tunnelling; vacuum microelectronics; MOS electron tunneling cathode; Si-SiO/sub 2/; conduction band; depletion gate; depletion region; effective mean-free-path; emission current level; hole injection; hot electrons; transfer ratio; vacuum microelectronics; Acceleration; Cathodes; Diodes; Electron beams; Electron emission; Elementary particle vacuum; Microelectronics; Scattering; Tellurium; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
Conference_Location :
Portland, OR, USA
Print_ISBN :
0-7803-2143-X
Type :
conf
DOI :
10.1109/IVMC.1995.487098
Filename :
487098
Link To Document :
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