• DocumentCode
    3253234
  • Title

    3 Dimensional GAA Transitors : twin silicon nanowire MOSFET and multi-bridge-channel MOSFET

  • Author

    Park, Donggun

  • Author_Institution
    Samsung Electron., Giheung
  • fYear
    2006
  • fDate
    2-5 Oct. 2006
  • Firstpage
    131
  • Lastpage
    134
  • Abstract
    In this paper, as the candidates of MOSFET for high performance and channel length scale below 10 nm, gate-all-around (GAA) multi-bridge-channel MOSFETs (MBCFETs) and twin Si-nanowire MOSFETs (TSNWFETs) are introduced. These are Si-based transistors with an ultimate structure for future scaled devices. N-ch MBCFET with two bridges shows 3.5 mA/um and 13 nA/um of Ion and Ioff, respectively. N-ch TSNWFET shows 2.64 mA/um with two 10 nm diameter Si-wire and gate length of 30 nm. Both transistors show excellent short channel effects
  • Keywords
    MOSFET; elemental semiconductors; nanowires; silicon; 30 nm; Si; gate-all-around MOSFET; multibridge-channel MOSFET; short channel effects; twin silicon nanowire MOSFET; CMOS process; Conference proceedings; Etching; Fabrication; Germanium silicon alloys; MOSFET circuits; Nanoscale devices; Random access memory; Silicon germanium; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    International SOI Conference, 2006 IEEE
  • Conference_Location
    Niagara Falls, NY
  • ISSN
    1078-621X
  • Print_ISBN
    1-4244-0289-1
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2006.284471
  • Filename
    4062919