DocumentCode :
3253234
Title :
3 Dimensional GAA Transitors : twin silicon nanowire MOSFET and multi-bridge-channel MOSFET
Author :
Park, Donggun
Author_Institution :
Samsung Electron., Giheung
fYear :
2006
fDate :
2-5 Oct. 2006
Firstpage :
131
Lastpage :
134
Abstract :
In this paper, as the candidates of MOSFET for high performance and channel length scale below 10 nm, gate-all-around (GAA) multi-bridge-channel MOSFETs (MBCFETs) and twin Si-nanowire MOSFETs (TSNWFETs) are introduced. These are Si-based transistors with an ultimate structure for future scaled devices. N-ch MBCFET with two bridges shows 3.5 mA/um and 13 nA/um of Ion and Ioff, respectively. N-ch TSNWFET shows 2.64 mA/um with two 10 nm diameter Si-wire and gate length of 30 nm. Both transistors show excellent short channel effects
Keywords :
MOSFET; elemental semiconductors; nanowires; silicon; 30 nm; Si; gate-all-around MOSFET; multibridge-channel MOSFET; short channel effects; twin silicon nanowire MOSFET; CMOS process; Conference proceedings; Etching; Fabrication; Germanium silicon alloys; MOSFET circuits; Nanoscale devices; Random access memory; Silicon germanium; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
International SOI Conference, 2006 IEEE
Conference_Location :
Niagara Falls, NY
ISSN :
1078-621X
Print_ISBN :
1-4244-0289-1
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2006.284471
Filename :
4062919
Link To Document :
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