• DocumentCode
    3253263
  • Title

    Electrical characteristics of sealed field emission diodes using sharp vertical edge structures

  • Author

    Schiller, P.J. ; Zurn, S.M. ; Polla, D.L.

  • Author_Institution
    Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
  • fYear
    1995
  • fDate
    July 30 1995-Aug. 3 1995
  • Firstpage
    513
  • Lastpage
    515
  • Abstract
    This paper describes the electrical characteristics of a sealed, field emission diode which use sharp vertical edge structures. The sharp vertical edges were formed using self-aligned conformal thin film deposition techniques, while the recessed sealed vacuum cavities were formed using standard semiconductor fabrication techniques. The I-V characteristics of the diodes were obtained for a variety of devices and are similar to the Fowler-Nordheim equation. This indicates that field emission is the source of electron current for the devices. In addition, it was found that the current of the devices scales linearly with the area of the sharp vertical edges, which indicates that the sharp vertical edges are the source of electron emission.
  • Keywords
    diodes; electron field emission; seals (stoppers); vacuum microelectronics; Fowler-Nordheim equation; electrical characteristics; fabrication; recessed vacuum cavity; sealed field emission diode; self-aligned conformal thin film deposition; vertical edge structure; Anodes; Cathodes; Electric variables; Electrodes; Electron emission; Fabrication; Flat panel displays; Semiconductor diodes; Silicon; Vacuum technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1995. IVMC., 1995 International
  • Conference_Location
    Portland, OR, USA
  • Print_ISBN
    0-7803-2143-X
  • Type

    conf

  • DOI
    10.1109/IVMC.1995.487103
  • Filename
    487103