DocumentCode :
3254241
Title :
Effects of polysilicon shield on spiral inductors for silicon-based RF IC´s
Author :
Sia, C.B. ; Yeo, K.S. ; Goh, W.L. ; Swe, T.N. ; Ng, C.Y. ; Chew, W. ; Loh, W.B. ; Chu, Sanford ; Chan, Lap
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
fYear :
2001
fDate :
2001
Firstpage :
158
Lastpage :
161
Abstract :
Increasing demands for more affordable personal mobile communication equipment have motivated research and development of low cost, high performance silicon-based on-chip inductors. Current silicon technology uses a conductive substrate, which causes unwanted energy dissipation. Inserting a patterned polysilicon shield beneath inductors can help reduce this substrate loss. Effects of the polysilicon ground shield on inductor performance have been investigated. An inductor utilizing a new high resistivity polysilicon floating shield is shown in this paper to have improved inductive characteristics
Keywords :
CMOS integrated circuits; Q-factor; UHF integrated circuits; elemental semiconductors; inductors; shielding; silicon; RF IC; Si; Si-based RFICs; ground shield; high resistivity floating shield; onchip inductors; patterned polysilicon shield; polysilicon shield; spiral inductors; substrate loss reduction; Active inductors; Costs; Energy dissipation; Mobile communication; Q factor; Radio frequency; Radiofrequency integrated circuits; Silicon; Spirals; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 2001. Proceedings of Technical Papers. 2001 International Symposium on
Conference_Location :
Hsinchu
ISSN :
1524-766X
Print_ISBN :
0-7803-6412-0
Type :
conf
DOI :
10.1109/VTSA.2001.934507
Filename :
934507
Link To Document :
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