DocumentCode :
3255017
Title :
Integration of a low stress photopatternable silicone into a wafer level package
Author :
Gardner, G. ; Harkness, B. ; Ohare, E. ; Meynen, H. ; Bulcke, M.V. ; Gonzalez, M. ; Beyne, E.
Author_Institution :
Dow Corning Corp., Midland, MI, USA
Volume :
1
fYear :
2004
fDate :
1-4 June 2004
Firstpage :
170
Abstract :
This paper describes a novel wafer level package using a silicone under the bump (SUB) design. The SUB architecture is designed to access the elastomeric qualities of silicones to reduce stresses on solder joints in a chip scale package. Poor reliability of the solder joints frequently arises from stresses generated by the mismatch in coefficient of thermal expansion between the die and the printed circuit board (PCB). Integration of a low modulus silicone pad between the die and solder ball allows for additional deformation mechanisms to dissipate stress between the die and the PCB during thermal cycling, increasing device reliability. Key to the realization of a SUB device was the integration of an elastomeric pad using the recently commercialized Dow Corning® WL-5150 photodefinable spin-on silicone. SUB devices containing 40 μm thick silicone pads were successfully built using a series of standard processing steps including photolithography, plasma cleaning, and metallization. Two different SUB solder joint designs, suggested by FEA, were constructed and evaluated under thermal cycling. Failure mechanisms in the devices were determined to be dependent on the metallization scheme for the electronic connections. Incorporation of the silicone pads in a SUB device resulted in a 90% increase in reliability relative to control devices without the silicone pad. The failure mechanisms observed suggested an intermediate metallization approach to further enhance reliability.
Keywords :
chip scale packaging; elastomers; failure analysis; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; silicones; thermal expansion; thermal stresses; 40 micron; WL-5150 photodefinable spin-on silicone; chip scale package; die/PCB CTE mismatch; elastomeric pad; failure analysis; finite element analysis; low modulus silicone pad; low stress photopatternable silicone; metallization; photolithography; plasma cleaning; silicone elastomeric qualities; silicone under bump design; solder ball; solder joint reliability; solder joint stress reduction; stress dissipating deformation mechanisms; thermal cycling; wafer level package; Chip scale packaging; Electronic packaging thermal management; Failure analysis; Integrated circuit reliability; Metallization; Printed circuits; Soldering; Thermal expansion; Thermal stresses; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 2004. Proceedings. 54th
Print_ISBN :
0-7803-8365-6
Type :
conf
DOI :
10.1109/ECTC.2004.1319332
Filename :
1319332
Link To Document :
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