AFM Applications to the Study of Thin Films Morphology: A Power Spectral Density Approach

Author

Gavrila, R. ; Dinescu, A. ; Mardare, D.

Author_Institution

R & D Inst. for Microtechnology, Bucharest

Volume

1

fYear

2006

fDate

27-29 Sept. 2006

Firstpage

167

Lastpage

170

Abstract

Three thin TiO₂ films obtained by magnetron sputtering onto glass in different deposition conditions were compared with respect of their morphologies by means of AFM investigations. Acquired AFM data were processed in order to get the power spectral densities (PSD) of the films and glass substrate. For each sample the PSDs computed at two scan sizes were combined in a single PSD curve with an extended range of spatial frequencies. The obtained PSD curves were fitted with a suitable theoretical model and characteristic parameters were deduced and discussed in order to compare the film morphologies in conjunction with deposition conditions

Keywords

atomic force microscopy; curve fitting; glass; sputter deposition; surface morphology; thin films; titanium compounds; AFM applications; AFM data; PSD curve; TiO₂; glass substrate; magnetron sputtering; power spectral density approach; thin TiO₂ films; thin film morphology; Optical films; Optical filters; Optical refraction; Optical scattering; Optical surface waves; Rough surfaces; Surface morphology; Surface roughness; Surface topography; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

International Semiconductor Conference, 2006

Conference_Location

Sinaia

Print_ISBN

1-4244-0109-7

Type

conf

DOI

10.1109/SMICND.2006.283959

Filename

4063186