Title :
On-line synthesis of supervisors for discrete events in automated manufacturing systems
Author :
Tianlong, Gu ; Jinchang, Gao ; Chunhui, Zhou
Author_Institution :
Dept. of Comput., Guilin Inst. of Electron. Technol., China
Abstract :
Mutual exclusion and synchronization are two important control problems of discrete events in automated manufacturing systems. Mutual exclusion concerns itself with allowing only one process at a time to use a certain resource. Synchronization concerns itself with the coordination of events in the interacting processes. These two control problems can be specified by the legal constraint languages with forbidden states and forbidden event strings. Ramadge and Wonham proposed (1987) a formal framework for studying discrete logic systems and algorithms for the automatic synthesis of supervisory controllers from their specifications. However, an explicit implementation of these algorithms is often not practical because the size of the discrete state-space renders traditional computational methods infeasible. In this paper, we developed an online synthesis scheme of supervisors for discrete events of automated manufacturing systems under the legal constraint languages. Some theoretic issues about this online synthesis scheme, such as, monotonicity and convergence, were also discussed
Keywords :
constraint theory; control system synthesis; discrete event systems; formal languages; production control; synchronisation; automated manufacturing systems; convergence; discrete events; discrete logic systems; event coordination; forbidden event strings; forbidden states; interacting processes; legal constraint languages; monotonicity; mutual exclusion; online synthesis; supervisor synthesis; supervisory controllers; synchronization; Automatic control; Automatic logic units; Control system synthesis; Control systems; Discrete event systems; Law; Legal factors; Manufacturing systems; Optimal control; Size control;
Conference_Titel :
Industrial Technology, 1996. (ICIT '96), Proceedings of The IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-3104-4
DOI :
10.1109/ICIT.1996.601566