Synthesis of Geometrical Shape of the Distributed Resistive Microelectronic Structures for Maximum Robustness

This paper presents some results obtained by the authors referring to the synthesis of resistive distributed microelectronic structures as to find out the optimal geometric shape regarding the maximal robustness. Various functional devices were synthesized in an attempt to optimize their electrical specifications and in order to find out realistic solutions. Practical results for synthesis of precision voltage attenuators using distributed resistive microelectronic structures, characterized by a very high tolerance towards usual fabrication errors, are presented. Invariance of the main electrical parameters better than 0.1% for mask alignment errors as high as 5% is obtained, which means that these structures can be mass produced without need of any final trimming