DocumentCode
3258316
Title
Novel technique for mechanical stresses determination in thin films
Author
Emelyanov, V.A. ; Baranov, Valentine
Author_Institution
Sci. Ind. Amalgamation, Minsk, Belarus
fYear
2004
fDate
6-8 Dec. 2004
Firstpage
692
Lastpage
695
Abstract
A novel technique for mechanical stresses determination in thin films has been proposed and tested for thin metal films on refractory metals basis. The new method provides the possibility of mechanical stresses distribution determination along of the films thickness. Experimental results concern films of Mo and alloys of Mo-Re deposited with a magnetron sputtering. Films material and sputtering conditions influence on a profile shape of the films fixed with SEM and on the total mechanical stresses values are described.
Keywords
aluminium alloys; internal stresses; mechanical testing; metallic thin films; molybdenum alloys; rhenium alloys; scanning electron microscopy; silicon alloys; sputtered coatings; Mo-Re deposition; SEM; film thickness; magnetron sputtering; mechanical stress distribution; mechanical testing; refractory metals; thin metal films; Dielectric thin films; Microelectronics; Optical films; Semiconductor films; Semiconductor thin films; Silicon; Sputtering; Stress; Temperature; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 2004. ICM 2004 Proceedings. The 16th International Conference on
Print_ISBN
0-7803-8656-6
Type
conf
DOI
10.1109/ICM.2004.1434760
Filename
1434760
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