Title :
Error factors affecting the result of Laser Interference Lithography
Author :
Jin Zhang ; Shilei Jiang ; Chunlei Tan ; Zuobin Wang ; Dayou Li ; Yong Yue ; Renxi Qiu ; Guobin Sun ; Lihong Yang ; Sanlong Wang
Author_Institution :
Shaanxi Province Key Lab. of Thin Films Technol. & Opt. Test, Xi´an Technol. Univ., Xi´an, China
Abstract :
Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.
Keywords :
laser beam applications; photolithography; errors factors; laser interference lithography; patterns quality; periodic structures; Adaptive optics; Interference; Laser beams; Lithography; Optical device fabrication; Resists; Substrates; constrast; error factors; interference lithography;
Conference_Titel :
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2013 International Conference on
Conference_Location :
Suzhou
Print_ISBN :
978-1-4799-1210-0
DOI :
10.1109/3M-NANO.2013.6737387
