DocumentCode
3258680
Title
Error factors affecting the result of Laser Interference Lithography
Author
Jin Zhang ; Shilei Jiang ; Chunlei Tan ; Zuobin Wang ; Dayou Li ; Yong Yue ; Renxi Qiu ; Guobin Sun ; Lihong Yang ; Sanlong Wang
Author_Institution
Shaanxi Province Key Lab. of Thin Films Technol. & Opt. Test, Xi´an Technol. Univ., Xi´an, China
fYear
2013
fDate
26-30 Aug. 2013
Firstpage
70
Lastpage
73
Abstract
Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.
Keywords
laser beam applications; photolithography; errors factors; laser interference lithography; patterns quality; periodic structures; Adaptive optics; Interference; Laser beams; Lithography; Optical device fabrication; Resists; Substrates; constrast; error factors; interference lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2013 International Conference on
Conference_Location
Suzhou
Print_ISBN
978-1-4799-1210-0
Type
conf
DOI
10.1109/3M-NANO.2013.6737387
Filename
6737387
Link To Document