Studies on H2O-based Al2O3 deposited on as-grown CVD graphene

Author

Wenrong Wang ; Chen Liang ; Tie Li ; Yuelin Wang

Author_Institution

State Key Labs. of Transducer Technol., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China

fYear

2013

fDate

26-30 Aug. 2013

Firstpage

5

Lastpage

8

Abstract

In this paper, graphene films were synthesized by chemical vapor deposition. Raman spectra and transmission electron microscope indicated the graphene films were few-layer. Al₂O₃ films were grown directly onto the surface of graphene transferred on SiO₂/Si by H₂O-based atomic layer deposition method. Experiments revealed that the distribution of physically adsorbed H₂O molecules on the surface of graphene decided the morphology of Al₂O₃ film, and the O/Al ratio was close to stoichiometric condition of 1.5.

Keywords

Raman spectra; aluminium compounds; atomic layer deposition; chemical vapour deposition; graphene; thin films; transmission electron microscopy; C; CVD; H₂O-Al₂O₃; Raman spectra; atomic layer deposition; chemical vapor deposition; graphene films; physically adsorbed molecules; transmission electron microscopy; Aluminum oxide; Atomic layer deposition; Decision support systems; Graphene; Silicon; Al2O3; atomic layer deposition (ALD); chemical vapor deposition (CVD); graphene;

fLanguage

English

Publisher

ieee

Conference_Titel

Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2013 International Conference on

Conference_Location

Suzhou

Print_ISBN

978-1-4799-1210-0

Type

conf

DOI

10.1109/3M-NANO.2013.6737390

Filename

6737390