Title :
Composition changes in sputter deposition of Y-Ba-Cu-O films
Author :
Hoshi, Y. ; Naoe, M.
Author_Institution :
Tokyo Institute of Polytechnics
Keywords :
Electron emission; Kinetic energy; Plasma temperature; Silicon; Sputtering; Substrates; Yttrium barium copper oxide;
Conference_Titel :
Magnetics Conference, 1989. Digests of INTERMAG '89., International
Conference_Location :
Washington, DC, USA
DOI :
10.1109/INTMAG.1989.690055
