DocumentCode :
3259577
Title :
Challenges And Issues Of Low-k Dielectrics
Author :
Chiang, Chien ; Mack, Anne S. ; Pan, Chuanbin ; Fraser, David B.
fYear :
1997
fDate :
3-5 June 1997
Firstpage :
37
Lastpage :
39
Keywords :
Dielectric constant; Dielectric materials; Integrated circuit interconnections; Polymer films; Power system interconnection; Silicon compounds; Stability; Temperature; Thermal expansion; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
Conference_Location :
Taipei, Taiwan
ISSN :
1524-766X
Print_ISBN :
0-7803-4131-7
Type :
conf
DOI :
10.1109/VTSA.1997.614722
Filename :
614722
Link To Document :
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