Title :
Fabrication of micro- and nano- structures for antireflection by chemical etching method
Author :
Rong, Chunming ; Gu, X.-Y. ; Liu, W.-P. ; Zhang, Wensheng ; Zhang, Fang ; Yuan, Lei ; Wang, Y.Y. ; Peng, C.S.
Author_Institution :
Inst. of Inf. Opt. Eng., Soochow Univ., Suzhou, China
Abstract :
Periodic pyramid and random nanostructure binary structures of single-crystal silicon wafer was fabricated by chemical etching method. Much lower reflectance of silicon wafer with these structures was obtained compared with that of single pyramid arrays. The morphology and reflectivity of these structures, as well as the influence on nanostructures caused by rapid thermal annealing (RTA) time and temperature of gold film, were studied. An average reflectance of 1.97% was obtained under optimized condition.
Keywords :
elemental semiconductors; etching; infrared spectra; nanofabrication; nanostructured materials; periodic structures; semiconductor growth; silicon; ultraviolet spectra; visible spectra; RTA; Si; chemical etching method; gold film; morphology; nanostructured materials; periodic pyramid structures; rapid thermal annealing; reflectivity; single-crystal silicon wafer; Etching; Fabrication; Gold; Reflectivity; Silicon; Surface morphology; etching; periodic pyramid; random nanostructure; rapid thermal annealing; reflectance;
Conference_Titel :
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2013 International Conference on
Conference_Location :
Suzhou
Print_ISBN :
978-1-4799-1210-0
DOI :
10.1109/3M-NANO.2013.6737452
