Title :
Fluorine Penetration Suppression By Applying Amorphous Silicon In Wsi Gate Process
Author :
Wang, Han-Ching ; Shih, Chun-Hsing ; Jang, Wen-Yueh
Keywords :
Amorphous silicon; Annealing; CMOS process; Capacitance-voltage characteristics; Contact resistance; Controllability; Design for quality; Etching; Semiconductor films; Substrates;
Conference_Titel :
VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
Print_ISBN :
0-7803-4131-7
DOI :
10.1109/VTSA.1997.614725
