Title :
PC based image analyser for mask inspection
Author :
Mandlik, D.B. ; David, S.K.
Author_Institution :
Dept. of Electron. Sci., Poona Univ., India
Abstract :
An image analysis system for mask inspection is presented. A pattern recognition technique is described for registration and checking of masks. This approach has the advantage that the distortions in the image do not affect the accuracy of the pattern matching algorithm. The hardware, consisting of an image acquisition and display system, is discussed. The software used for the removal of noise, extraction of edges, and the corrections for image distortions is also discussed. The algorithm used for the inspection is defined. The results of the algorithm are presented, along with its capability to detect faults. The turnaround time and the future scope of the work are discussed
Keywords :
VLSI; computerised pattern recognition; computerised picture processing; inspection; integrated circuit manufacture; masks; microcomputer applications; PC based image analyser; capability to detect faults; checking of masks; corrections for image distortions; extraction of edges; future scope; image acquisition and display system; image analysis system; mask inspection; pattern matching algorithm; pattern recognition technique; registration; removal of noise; turnaround time; Computer displays; Computer errors; Costs; Fault detection; Image analysis; Image edge detection; Image processing; Inspection; Optical filters; Pattern recognition;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1989, Proceedings. Seventh IEEE/CHMT International
Conference_Location :
San Francisco, CA
DOI :
10.1109/EMTS.1989.69006
