DocumentCode
3261077
Title
Position Error Inspection for Mounting Wafer in Cleaning Device Using the Radial Shape Board
Author
Lee, Jung Woo ; Lee, Byung-Gook ; Lee, Joon-Jea ; Yoon, Jungho
Author_Institution
Div. of Comput. Inf. Eng., Dongseo Univ., Busan, South Korea
fYear
2009
fDate
15-17 July 2009
Firstpage
247
Lastpage
252
Abstract
In this paper, we propose a wafer position error recognition system using computer vision technology and radial shape board. Wafer is one of the material when create the semiconductor. Wafer must be cleaned by the chemical during creating the semiconductor process .In this step, the robot moves wafer into the cleaning system. But sometime, the robot puts the wafer into an incorrect location. In this case, the trouble of cleaning system may be caused by the incorrect position, even the wafer can be broken. To prevent this case, we are going to find the wafer position in cleaning system using the computer vision technology. We perform the calibration and image processing for knowing the correct position of wafer. In calibration process, we are going to use the radial shape board.
Keywords
cleaning; computer vision; errors; position control; semiconductor technology; cleaning device; computer vision technology; mounting wafer; position error recognition system; radial shape board; semiconductor process; Calibration; Chemical processes; Chemical technology; Cleaning; Computer errors; Computer vision; Inspection; Robots; Semiconductor materials; Shape; Calibration; Cleaning system; Radial Shape Board; wafer;
fLanguage
English
Publisher
ieee
Conference_Titel
Visualisation, 2009. VIZ '09. Second International Conference in
Conference_Location
Barcelona
Print_ISBN
978-0-7695-3734-4
Type
conf
DOI
10.1109/VIZ.2009.52
Filename
5230757
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