DocumentCode :
3261439
Title :
Improved Characteristics of 4H-SiC MESFET with Multi-recessed Drift Region
Author :
Chen, Zhuangliang ; Deng, Xiaochuan ; Luo, Xiaorong ; Zhang, Bo ; Li, Zhaoji
Author_Institution :
State key Laboratory of Electronic Thin Films and Integrated Devices, Chengdu, Sichuan, 610054, China
fYear :
2007
fDate :
3-4 June 2007
Firstpage :
82
Lastpage :
85
Abstract :
4H-SiC MESFET with multi-recessed drift region is proposed and the DC and RF characteristics are analyzed in this paper by 2D numerical simulation. The simulated results show that the breakdown voltage is about 68% larger than that of the conventional structure. The calculated maximum output power density at operation point VGS=-10V, VDS=40V are 9.6W/mm and 6.2W/mm respectively for 4H-SiC MESFETs with multi-recessed drift region structure and conventional structure. The multi-recesses eliminate the spaces adjacent to gate and stopped the depletion region extending towards drain and source. Compared to the conventional structure, the gate-source capacitance (CGS) and drain-gate capacitance (CDG) of multi-recessed drift region structure have both been reduced, which will result in a superior RF performance.
Keywords :
Capacitance; Doping; Electric breakdown; Laboratories; MESFETs; Power generation; Radio frequency; Silicon carbide; Thermal conductivity; Thin film devices; 4H-SiC; DC and RF characteristics; MESFET; multi-recesses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Semiconductor Technology, 2007. EDST 2007. Proceeding of 2007 International Workshop on
Conference_Location :
Tsinghua University
Print_ISBN :
1-4244-1098-3
Electronic_ISBN :
1-4244-1098-3
Type :
conf
DOI :
10.1109/EDST.2007.4289783
Filename :
4289783
Link To Document :
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