Title :
A solution of the mask overlay problem in microelectromechanical CAD (MEMCAD)
Author :
Harris, R.M. ; Senturia, S.D.
Author_Institution :
Microsyst. Technol. Labs., MIT, Cambridge, MA, USA
Abstract :
The authors present a computationally efficient algorithm for the processing of data from multiple multi-featured masks to produce a planar map of the device topography in a format compatible with mechanical CAD systems.<>
Keywords :
CAD; electronic engineering computing; masks; micromechanical devices; solid modelling; 3D solid model; algorithm; device topography; lithography; mask overlay; microelectromechanical CAD; multiple multi-featured masks; Biomembranes; Computational modeling; Etching; Fabrication; Laboratories; Resonance; Silicon; Solid modeling; Surfaces; Wafer bonding;
Conference_Titel :
Solid-State Sensor and Actuator Workshop, 1992. 5th Technical Digest., IEEE
Conference_Location :
Hilton Head Island, SC, USA
Print_ISBN :
0-7803-0456-X
DOI :
10.1109/SOLSEN.1992.228276
