مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

3264387

Title :

Design Rule Related Defects Formation

Author :

Hsieh, Y.F. ; Tsui, B.Y.

fYear :

1997

fDate :

3-5 June 1997

Firstpage :

138

Lastpage :

141

Keywords :

Amorphous materials; CMOS technology; Crystalline materials; Density measurement; Electronics industry; Implants; Industrial electronics; Ion implantation; Leakage current; Microelectronics;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on

Conference_Location :

Taipei, Taiwan

ISSN :

1524-766X

Print_ISBN :

0-7803-4131-7

Type :

conf

DOI :

10.1109/VTSA.1997.614745

Filename :

614745

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3264387