Title :
Chemically assisted ion beam etching of optical microresonators
Author :
Scherer, Axel ; Cheng, C.C. ; Painter, Oskar ; Lee, Razak ; Yariv, Amnon ; Fainman, Yeshaiahu
Abstract :
Summary form only given. 1-D, 2-D, 3-D microstructures with lateral dimensions at the scale of the wavelength of light can be used to generate high finesse microresonators. These have been fabricated in the AlGaAs system by combining MBE growth with micro-fabrication. Here we show the applications of anisotropic ion beam etching and high resolution lithography in the fabrication of high-finesse micro-resonators and discuss their performance as low-threshold microlasers, fast optical switches, photonic bandgap mirrors and polarizing beam-splitters
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; lithography; molecular beam epitaxial growth; optical fabrication; optical resonators; sputter etching; 1D microstructure; 2D microstructure; 3D microstructure; AlGaAs; MBE growth; anisotropic ion beam etching; chemically assisted ion beam etching; fabrication; high resolution lithography; high-finesse optical microresonator; microlaser; optical switch; photonic bandgap mirror; polarizing beam-splitter; Anisotropic magnetoresistance; Chemicals; Etching; Geometrical optics; Ion beams; Lithography; Microcavities; Microstructure; Optical beams; Particle beam optics;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3895-2
DOI :
10.1109/LEOS.1997.645277
