DocumentCode :
3267829
Title :
Oxide-confined VCSELs with quantum well and quantum dot active regions
Author :
Deppe, D.G. ; Huffaker, D.L. ; Deng, Q. ; Oh, T.-H. ; Graham, L.A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
Volume :
2
fYear :
1997
fDate :
10-13 Nov 1997
Firstpage :
287
Abstract :
In this talk we will describe some recent results of low threshold VCSELs that show improved performance with the use of tunnel injection of electrons, and the application of quantum dot (QD) active regions. As the VCSEL active region size is reduced the threshold current density increases, and at high current densities loss of injected electrons over the p-type heterobarrier can both increase the lasing threshold and, due to insufficient Fermi-level clamping, reduce the VCSEL´s differential slope efficiency
Keywords :
current density; laser cavity resonators; quantum well lasers; semiconductor quantum dots; surface emitting lasers; tunnelling; Fermi-level clamping; VCSEL active region size; differential slope efficiency; electron injection; high current densities; lasing threshold; low threshold VCSELs; oxide-confined VCSELs; p-type heterobarrier; quantum dot active regions; threshold current density; tunnel injection; Apertures; Contracts; Electrons; Gallium arsenide; Microelectronics; Quantum dots; Temperature; Threshold current; US Department of Transportation; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE
Conference_Location :
San Francisco, CA
ISSN :
1092-8081
Print_ISBN :
0-7803-3895-2
Type :
conf
DOI :
10.1109/LEOS.1997.645421
Filename :
645421
Link To Document :
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