Title :
On parameter estimation using level sets [plasma etching]
Author_Institution :
Dept. of Mech. Eng., Texas Tech. Univ., Lubbock, TX, USA
Abstract :
Consider the problem of selecting the member of a parametrized family of curves that best matches a given curve. This is a key step in determining proper values for adjustable parameters in low-order plasma etching and deposition models. Level set methods offer several attractive features for treating such problems. This paper presents a parameter estimation scheme that exploits the level set formulation. The method is completely geometric; there is no need to introduce an arbitrary coordinate system for the curves
Keywords :
curve fitting; integrated circuit manufacture; parameter estimation; process control; sputter etching; IC manufacture; coordinate system; curve matching; deposition models; level sets; parameter estimation; plasma etching; thin film deposition; Costs; Electrons; Etching; Level set; Microelectronics; Parameter estimation; Plasma applications; Plasma chemistry; Plasma devices; Shape;
Conference_Titel :
American Control Conference, 1998. Proceedings of the 1998
Conference_Location :
Philadelphia, PA
Print_ISBN :
0-7803-4530-4
DOI :
10.1109/ACC.1998.703347
