DocumentCode :
326804
Title :
Temperature dependent characterization of silicon power semiconductors-a new physical model validated by device internal probing between 400 K and 100 K
Author :
Schlög, A.E. ; Mnatsakanov, T.T. ; Kuhn, H. ; Schröder, D.
Author_Institution :
Tech. Univ. Munchen, Germany
Volume :
2
fYear :
1998
fDate :
17-22 May 1998
Firstpage :
1720
Abstract :
A new physical model for characterizing the temperature dependent operation of power semiconductor devices is presented. It is based on the application of a new continuity equation for describing the carrier transport in the low doped layer of power semiconductor structures. Modern results of carrier mobility description, particularly concerning EHS (electron hole scattering) are strictly taken into account even as temperature conditioned effective ionization of doping atoms. The model is validated by FCA (free carrier absorption) experiments at temperatures between 100 K and 400 K
Keywords :
carrier mobility; elemental semiconductors; ionisation; power semiconductor devices; semiconductor device models; semiconductor doping; silicon; thermal analysis; 100 to 400 K; Si; carrier mobility description; carrier transport; continuity equation; device internal probing; doping atoms; electron hole scattering; free carrier absorption; low doped layer; physical model; power semiconductor structures; silicon power semiconductors; temperature conditioned effective ionization; temperature dependent characterization; Atomic layer deposition; Charge carrier processes; Electron mobility; Equations; Ionization; Power semiconductor devices; Scattering; Semiconductor device doping; Silicon; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Electronics Specialists Conference, 1998. PESC 98 Record. 29th Annual IEEE
Conference_Location :
Fukuoka
ISSN :
0275-9306
Print_ISBN :
0-7803-4489-8
Type :
conf
DOI :
10.1109/PESC.1998.703413
Filename :
703413
Link To Document :
بازگشت