• DocumentCode
    3268551
  • Title

    Rule-Based Inspection of Wafer Surface

  • Author

    Shankar, N.G. ; Zhong, Z.-W.

  • Author_Institution
    Euro Technology Pte Ltd, Tech Place 1, Singapore 569628
  • fYear
    2003
  • fDate
    12-12 June 2003
  • Firstpage
    752
  • Lastpage
    755
  • Abstract
    A template-based vision system for the 100% inspection of wafer die surfaces has been developed. Design goals included a requirement for the detection of flaws as small as 1μm on parts up to 8-inch wafer size. Each die is treated as one part of the whole wafer. One of the good dies is trained and kept as template die for the whole wafer. The die physical location data are generated, before hand, from CAD designs using a wafer map editor (WME). A separate software package called the wafer map editor was developed to generate setup data needed during the runtime of the inspection process. The WME also generates a part defect wafermap. Each unique die pattern in the wafer is defined as an object and these objects are grouped into userdefined categories such as good die pads and defect die pads. The defect wafer map is used during the runtime inspection of die attach to avoid picking of bad die pads.
  • Keywords
    Automation; Defect detection; Image processing; Pattern recognition; Rule-Based; Semiconductor; Yield enhancement; Automation; Defect detection; Image processing; Pattern recognition; Rule-Based; Semiconductor; Yield enhancement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Control and Automation, 2003. ICCA '03. Proceedings. 4th International Conference on
  • Conference_Location
    Montreal, Que., Canada
  • Print_ISBN
    0-7803-7777-X
  • Type

    conf

  • DOI
    10.1109/ICCA.2003.1595123
  • Filename
    1595123