DocumentCode :
3269233
Title :
A Behavioral Modeling Approach For 0.25pm Dual-gate Mosfet Design Optimization
Author :
Yang, Jiuun-Jer ; Lin, Chih-Hsien ; Young, Konrad ; Chiu, Kuang-Yi
fYear :
1997
fDate :
3-5 June 1997
Firstpage :
255
Lastpage :
259
Keywords :
Design methodology; Design optimization; Electronics industry; Implants; Industrial electronics; MOSFET circuits; Process design; Rapid thermal annealing; Response surface methodology; Solids;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications, 1997. Proceedings of Technical Papers. 1997 International Symposium on
Conference_Location :
Taipei, Taiwan
ISSN :
1524-766X
Print_ISBN :
0-7803-4131-7
Type :
conf
DOI :
10.1109/VTSA.1997.614770
Filename :
614770
Link To Document :
بازگشت