Title :
Noise-analyzing of piezoresistive silicon materials
Author :
Yu, Xiaomei ; Li, Ting ; Zhang, Dacheng
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
A good cantilever should possess a small minimum detectable deflection (MDD), which depends on the measurement sensitivity and noise. Although increasing the measurement sensitivity can decrease the MDD of a cantilever, the noise will be a mainly limited factor when the measurement sensitivity is further increased. Therefore, the noise analyses of a piezoresistive cantilever are very important in improving cantilever resolutions. In this paper we analyze the noise characteristics of three silicon materials based on a large number of noise measurement results, which show that the 1/f noise is the dominant noise source at low frequencies and noise at high frequencies is Johnson noise. With the linear relation between 1/f noise and 1/L (piezoresistor length), Hooge factor α of three materials was calculated. Optimized piezoresistor dimensions for a piezoresistive cantilever are given at last.
Keywords :
1/f noise; electric noise measurement; microsensors; piezoresistive devices; silicon; thermal noise; 1/f noise; Hooge factor; Johnson noise; cantilever resolutions; measurement sensitivity; minimum detectable deflection; noise measurement; piezoresistive silicon materials; piezoresistor length; silicon materials; Amorphous silicon; Biosensors; Chemical and biological sensors; Crystalline materials; Low-frequency noise; Magnetic sensors; Mechanical sensors; Noise measurement; Optical interferometry; Piezoresistance;
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
DOI :
10.1109/ICSICT.2004.1435279