DocumentCode :
3269594
Title :
Advanced technology development at SEMATECH
Author :
Dao, Giang
Author_Institution :
Sematech, Austin, TX, USA
fYear :
2005
fDate :
25-28 Oct. 2005
Firstpage :
4
Lastpage :
5
Abstract :
The development of advanced technology is significantly impacted by the cost and complexity of bringing it from research to manufacturing. SEMATECH, a global consortium of major semiconductor manufacturers, has evolved over the last two decades to address this and other challenges of the chip industry. In doing so, we have become deeply attuned to the necessity of honing our R&D activities in ways that reduce time to market, and time to money. Our R&D activities include: lithography, which concentrates on extreme ultraviolet (EUV) and 193 nm immersion technologies, as well as development of advanced resists and affordable masks; front end processes, which focuses on CMOS scaling, including high-k and metal electrode materials and channel engineering; interconnect, where our primary focus is resistance-capacitance (RC) delay. We also maintain two major university-based programs in our efforts to develop advanced technology.
Keywords :
CMOS integrated circuits; electron device manufacture; electronic engineering education; electronics industry; immersion lithography; integrated circuit interconnections; masks; research and development; resists; technology management; ultraviolet lithography; 193 nm; CMOS scaling; R&D activities; SEMATECH consortium; advanced technology development; channel engineering; chip industry; extreme ultraviolet lithography; front end processes; high-k materials; immersion lithography; interconnect technology; mask development; metal electrode materials; resist development; resistance-capacitance delay; semiconductor manufacture; university-based programs; CMOS process; CMOS technology; Costs; Lithography; Manufacturing industries; Research and development; Resists; Semiconductor device manufacture; Time to market; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
Type :
conf
DOI :
10.1109/IMNC.2005.203709
Filename :
1595185
Link To Document :
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