Title :
Side-wall measurement using tilt-scanning method in atomic force microscope
Author :
Murayama, Ken ; Gonda, Satoshi ; Koyanagi, Hajime ; Terasawa, Tsuneo
Author_Institution :
MIRAI, Assoc. of Super-Adv. Electron. Technol., Tsukuba, Japan
Abstract :
We have developed a novel AFM (atomic force microscope) measurement technique which can examine side-walls of fine patterns etched into wafers. This technique uses a sharpen tip tilted at an angle in combination with a "step-in" mode operation, and is thus referred as "tilt-step-in" mode. This method allows one to measure side wall shape including under cut and line edge roughness (LER).
Keywords :
atomic force microscopy; surface roughness; surface topography measurement; atomic force microscope; line edge roughness; side-wall measurement technique; step-in mode operation; tilt-scanning method; tilt-step-in mode operation; Atomic force microscopy; Atomic measurements; Electron microscopy; Electronics industry; Etching; Force measurement; Industrial electronics; Resists; Scanning electron microscopy; Shape measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203739
