• DocumentCode
    3270182
  • Title

    Molecular resists based on cholate derivatives for electron-beam lithography

  • Author

    Shiono, Daiju ; Hirayama, Taku ; Kasai, Kohei ; Hada, Hideo ; Onodera, Junichi ; Arai, Tadashi ; Yamaguchi, Atsuko ; Shiraishi, Hiroshi ; Fukuda, Hiroshi

  • Author_Institution
    Tokyo Ohka Kogyo Co. Ltd., Kanagawa, Japan
  • fYear
    2005
  • fDate
    25-28 Oct. 2005
  • Firstpage
    68
  • Lastpage
    69
  • Abstract
    We have reported the characteristics and LER properties of molecular resists based on low molecular weight polyphenols as a chemically amplified (CA) positive-tone EB resist (Hirayama et al., 2004; Hirayama et al., 2005). In this paper, new molecular resist based on cholate derivatives for EB lithography was reported.
  • Keywords
    electron resists; molecular weight; polymers; surface roughness; cholate derivatives; electron-beam lithography; line edge roughness; low molecular weight polyphenols; molecular resists; positive-tone EB resist; Chemicals; Circuits; Etching; Geometry; Helium; Large scale integration; Lithography; Resists; Ultraviolet sources; Weight control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2005 International
  • Print_ISBN
    4-9902472-2-1
  • Type

    conf

  • DOI
    10.1109/IMNC.2005.203741
  • Filename
    1595217
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3270182