Title :
Molecular resists based on cholate derivatives for electron-beam lithography
Author :
Shiono, Daiju ; Hirayama, Taku ; Kasai, Kohei ; Hada, Hideo ; Onodera, Junichi ; Arai, Tadashi ; Yamaguchi, Atsuko ; Shiraishi, Hiroshi ; Fukuda, Hiroshi
Author_Institution :
Tokyo Ohka Kogyo Co. Ltd., Kanagawa, Japan
Abstract :
We have reported the characteristics and LER properties of molecular resists based on low molecular weight polyphenols as a chemically amplified (CA) positive-tone EB resist (Hirayama et al., 2004; Hirayama et al., 2005). In this paper, new molecular resist based on cholate derivatives for EB lithography was reported.
Keywords :
electron resists; molecular weight; polymers; surface roughness; cholate derivatives; electron-beam lithography; line edge roughness; low molecular weight polyphenols; molecular resists; positive-tone EB resist; Chemicals; Circuits; Etching; Geometry; Helium; Large scale integration; Lithography; Resists; Ultraviolet sources; Weight control;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203741
