A new EUV irradiation and multilayer evaluation system for EUVL mirror contamination in NewSUBARU

Author

Niibe, Masahito ; Kakutani, Yukinobu ; Terashima, Shigeru ; Takase, Hiromitsu ; Gomei, Yoshio ; Mtsunari, Shuichi ; Aoki, Takashi ; Murakami, Katsuhiko ; Fukuda, Yasuaki

Author_Institution

Lab. of Adv. Sci. & Technol. for Ind., Hyogo Univ., Japan

fYear

2005

fDate

25-28 Oct. 2005

Firstpage

104

Lastpage

105

Abstract

Contamination on the multilayer (ML) mirrors for EUVL optics, which is caused by EUV irradiation during the exposure system operation, is a serious problem in order to realize EUV lithography. In this paper, a new high-intensity EUV irradiation and reflectivity measurement system, which had all metal-sealed vacuum chambers, was developed for investigation of the contamination inhibition mechanism.

Keywords

contamination; mirrors; optical multilayers; radiation effects; reflectivity; ultraviolet lithography; EUV irradiation; EUV lithography; EUVL mirror contamination; EUVL optics; NewSUBARU; contamination inhibition mechanism; exposure system operation; metal-sealed vacuum chambers; multilayer evaluation system; multilayer mirrors; reflectivity measurement system; Contamination; Laboratories; Lithography; Mirrors; Nonhomogeneous media; Pollution measurement; Reflectivity; Ultraviolet sources; Undulators; Vacuum systems;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2005 International

Print_ISBN

4-9902472-2-1

Type

conf

DOI

10.1109/IMNC.2005.203759

Filename

1595235