Title :
A new EUV irradiation and multilayer evaluation system for EUVL mirror contamination in NewSUBARU
Author :
Niibe, Masahito ; Kakutani, Yukinobu ; Terashima, Shigeru ; Takase, Hiromitsu ; Gomei, Yoshio ; Mtsunari, Shuichi ; Aoki, Takashi ; Murakami, Katsuhiko ; Fukuda, Yasuaki
Author_Institution :
Lab. of Adv. Sci. & Technol. for Ind., Hyogo Univ., Japan
Abstract :
Contamination on the multilayer (ML) mirrors for EUVL optics, which is caused by EUV irradiation during the exposure system operation, is a serious problem in order to realize EUV lithography. In this paper, a new high-intensity EUV irradiation and reflectivity measurement system, which had all metal-sealed vacuum chambers, was developed for investigation of the contamination inhibition mechanism.
Keywords :
contamination; mirrors; optical multilayers; radiation effects; reflectivity; ultraviolet lithography; EUV irradiation; EUV lithography; EUVL mirror contamination; EUVL optics; NewSUBARU; contamination inhibition mechanism; exposure system operation; metal-sealed vacuum chambers; multilayer evaluation system; multilayer mirrors; reflectivity measurement system; Contamination; Laboratories; Lithography; Mirrors; Nonhomogeneous media; Pollution measurement; Reflectivity; Ultraviolet sources; Undulators; Vacuum systems;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203759
