Combination of electron beam recorders and imprint lithography for realisation of patterned media and next generation optical media

In this paper we describe the process and the development work for production of the next generation master discs for both optical and magnetic media applications. The manufacturing approach employs two unique lithography systems. First, we use an electron beam recorder [EBR] to define the pattern on a master disc. Then, this master is used as a stamper in a nanoimprint lithography [NIL] system. Already today the combination of these lithography methods enables high volume manufacturing of structures down to 50 nm for patterned-media and optical storage media applications as well as 30 nm in R&D-related work.