Title :
On proximity effect in electron beam induced deposition
Author :
Mitsuishi, K. ; Shimojo, M. ; Takeguchi, M. ; Tanaka, M. ; Furuya, Keiichi
Author_Institution :
Nat. Inst. for Mater. Sci., Tsukuba, Japan
Abstract :
Beam induced deposition is versatile technique to fabricate nano-structure. In this paper, the proximity effect in electron beam induced deposition was studied, and the beam scan sequence which minimizes the effect was suggested.
Keywords :
electron beam deposition; electron beam lithography; proximity effect (lithography); beam scan sequence; electron beam induced deposition; proximity effect; Electron beams; Electron emission; Ion beams; Laboratories; Materials science and technology; Proximity effect; Scanning electron microscopy; Shape; Switches; Tungsten;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203784
