Title :
Resistivity measurements of nanorods formed by electron beam-induced deposition
Author :
Shimojo, M. ; Takeguchi, M. ; Che, R. ; Zhang, W. ; Tanaka, M. ; Mitsuishi, K. ; Furuya, K.
Author_Institution :
High Voltage Electron Microscopy Station, Nat. Inst. for Mater. Sci., Tsukuba, China
Abstract :
Insulators and conductors as well as semiconductors are necessary to make an electronic device. The electric properties of nanometer-sized structures or wires produced by EBID are, therefore, of importance for the application to nanodevices. In this paper, the resisitivity of nanorods produced by electron beam-induced deposition was measured.
Keywords :
electric resistance measurement; electrical resistivity; electron beam deposition; nanoelectronics; nanostructured materials; conductors; electric properties; electron beam-induced deposition; electronic device; inductors; nanodevices; nanometer-sized structures; nanorods; resistivity measurement; Conductivity; Electric variables measurement; Electron beams; Iron; Materials science and technology; Nanostructures; Scanning electron microscopy; Transmission electron microscopy; Voltage; Wires;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203786
