DocumentCode :
3271060
Title :
In situ generation and growth behavior of alpha-Fe nanocrystals by electron beam induced deposition using iron pentacarbonyl
Author :
Zhang, W. ; Shimojo, M. ; Takeguchi, M. ; Che, R. ; Furuya, K.
Author_Institution :
High Voltage Electron Microscopy Station, Nat. Inst. for Mater. Sci., Tsukuba, Japan
fYear :
2005
fDate :
25-28 Oct. 2005
Firstpage :
164
Lastpage :
165
Abstract :
In this work, it was found that alpha-Fe nanocrystals were generated and grew around the focused electron beam irradiation points (deposited nanodots) on the substrate at room temperature during the EBID process in an ultrahigh-vacuum field emission gun scanning electron microscope (UHV-FEG-SEM), operated at 30 kV with a precursor of Fe(CO)5.
Keywords :
electron beam deposition; field emission electron microscopy; iron compounds; nanostructured materials; nanotechnology; scanning electron microscopy; semiconductor growth; 30 kV; alpha-Fe nanocrystal; deposited nanodots; electron beam induced deposition; growth behavior; in situ generation; iron pentacarbonyl; ultrahigh-vacuum field emission gun scanning electron microscope; Electron beams; Electron emission; Focusing; Image generation; Iron; Materials science and technology; Nanocrystals; Nanostructures; Scanning electron microscopy; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
Type :
conf
DOI :
10.1109/IMNC.2005.203789
Filename :
1595265
Link To Document :
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