Title :
The possibility to fabricate supertip at the bottom surface of thin film using high-energy electrons
Author :
Liu, Z.Q. ; Mitsuishi, K. ; Furuya, K.
Author_Institution :
High Voltage Electron Microscopy Station, Nat. Inst. for Mater. Sci., Tsukuba, Japan
Abstract :
Tips fabricated with electron-beam-induced deposition (EBID) can be used as supertips of either scanning tunneling microscope or atomic force microscope. Recently, high-energy electrons were proved capable of obtaining smaller feature size than low-energy electrons (Mitsuishi et al., 2003). Since high-energy electrons In the present study, the possibility to fabricate supertip at the bottom surface of thin film was investigated theoretically.
Keywords :
electron beam deposition; nanotechnology; semiconductor thin films; surface structure; atomic force microscope; bottom surface; electron-beam-induced deposition; high-energy electrons; scanning tunneling microscope; supertip fabrication; thin film; Atomic force microscopy; Electron microscopy; Materials science and technology; Scanning electron microscopy; Substrates; Surface topography; Transistors; Tungsten; Tunneling; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203790
