Title :
Electronic and structural characteristics of atomic diffusion in Fe/Al [001] and Al/Fe [001] systems
Author :
Kim, Chiho ; Chung, Yong-Chae
Author_Institution :
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
Abstract :
In this study, the atomistic behaviors of surface diffusion and incorporation in Fe-Al multilayer systems were quantitatively investigated using density functional theory (DFT) calculation. The energy barrier, energy gain, charge density distribution, and density of states (DOS) were analyzed, in detail, to determine the factors governing the interface morphology and the growth mode for multilayer fabrication of extremely reduced dimension.
Keywords :
aluminium; density functional theory; interface states; iron; multilayers; surface diffusion; surface morphology; Al/Fe [001] systems; Fe-Al; Fe/Al(001) systems; atomic diffusion; atomistic behaviors; charge density distribution; density functional theory; electronic characteristics; energy barrier; energy gain; interface morphology; multilayer fabrication; states density; structural characteristics; surface diffusion; Aluminum alloys; Atomic layer deposition; Bonding; Bridges; Energy barrier; Iron alloys; Magnetic multilayers; Nickel alloys; Substrates; Surface morphology;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203802
