Title :
UV-based nanoimprint lithography for photosensitive dry film
Author :
Nakamatsu, Ken-ichiro ; Tone, Katsuhiko ; Matsui, Shinji
Author_Institution :
Graduate Sch. of Sci., Hyogo Univ., Japan
Abstract :
This paper proposes for the first time the UV-based NIL for commercially available planarized photosensitive dry film (Photec RY-3300 series, Hitach chemical Ltd.) on base sheet. The photosensitive dry film was formed by laminating method using laminating tool, as alternative to spin-coating process in use of liquid solution. The temperature and pressure for the laminating process were 110°C and 0.4 MPa, respectively. The rapid laminating speed of 1.5 m/min was used. The laminating method offered homogeneous dry resin that is needed to perform uniform imprinting. As another benefit, the dry film can be uniformly formed on various base film or substrate in large area. Result indicates that the photosensitive dry film formed by laminating method would be applied as the replication material for UV-based NIL process.
Keywords :
nanolithography; ultraviolet lithography; 0.4 MPa; 110 C; UV-based NIL process; laminating method; nanoimprint lithography; photosensitive dry film; replication material; spin-coating process; uniform imprinting; Costs; Fabrication; Nanolithography; Nanostructured materials; Planarization; Resins; Substrates; Temperature; Throughput; Viscosity;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2005 International
Print_ISBN :
4-9902472-2-1
DOI :
10.1109/IMNC.2005.203808
